LASER PRODUCED PLASMA - EUV

TEUS- 13.5nm light sources based on high power pulsed laser produced plasma

LPP EUV source is based on a fast-rotating liquid metal target. The novel LPP target with conventional debris mitigation techniques has resulted in an ultimate solution for a clean photon EUV source. Fast rotation target provides:
-Redirection of droplet debris away from input (laser) and output (EUV) windows
-Undisturbed target surface for a high rep rate laser system (up to 1 MHz)
-Minimum synchronisation required as the target is continuous
-Excellent inherent source spatial stability

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