7-9 November, 2016
Amsterdam, The Netherlands
"EUV Sources remain the key component for ensuring EUV Lithography’s entry into fabs for high-volume manufacturing. Two big factors that have enabled dramatic progress in source readiness are related to improvements in source power and source lifetime. Another important topic is EUV sources for metrology. Low power but brighter EUV sources than those available today are needed for actinic inspection of masks. We will have new potential designs from five suppliers for actinic EUV sources, as well as papers on high harmonic generation (HHG) and free electron laser (FEL) based sources for EUVL." by Vivek Bakshi, EUV Litho, Inc.
We are happy to announuce that ISTEQ will present on "2016 International Workshop on EUV and Soft X-Ray sources" in Amsterdam, the Netherlands.
27-28 Ocotober, 2016
ISTEQ will participate in the 2016 International Workshop on Compact EUV & X-ray light sources in Hiroshima, Japan. We will present the latest results regarding a high-brightness EUV LPP source for mask and wafer inspection.
13-16 June, 2016
ISTEQ participated in the 2016 International Workshop on EUV Lithography, held on June 13-16, 2016 at The Center for X-ray Optics (CXRO) at Lawrence Berkeley National Laboratory in Berkeley, CA. This workshop, now in its ninth year, was focused on the fundamental science of EUV Lithography (EUVL). EUV Lithography-related topics covered under this workshop include source for high volume manufacturing (HVM) and metrology, FEL based sources for EUVL, exposure tools, masks, optics, resist, contamination, metrology, patterning and cost of ownership.
ISTEQ have presented a new concept of Actinic EUV source for mask and wafer inspection.